溅射靶材
产品中心
产品描述
公司生产的氧化铌靶材采用先进的真空热压、热等静压和热喷涂工艺生产，产品包括矩形靶、圆弧靶和管靶等类型。
Our niobium oxide target including rectangular target, arc target and tube target is manufactured by hot isostatic pressing, hot pressing, and thermal spraying technology. Our niobium oxide target by HIP has been applied for Chinese invention patent with independent intellectual property rights. The patent number is CN105734506A.
|
氧化铌靶 Niobium oxide target |
性能 Product performance |
|
|
化学成分/at% Composition |
Nb2Ox，x=4.5～4.8 |
|
|
纯度/% Purity |
99.99 |
|
|
密度/g/cm3 Density |
≥4.5 |
|
|
晶粒度/μm Grain size |
≤5 |
|
|
金属杂质总和/ppm Total content of metallic impurities |
≤100 |
|
|
电阻率/Ω.cm Resistivity |
5×10-4 |
|
|
规格尺寸/mm Size |
平面靶 Planar target |
热等静压/热压，≤500×250 Hot isostatic pressing/Hot pressing |
|
旋转靶 Rotating target |
热喷涂成形 thermal spraying 长度Length≤4000 厚度Thickness≤10 |
|
关键词：
铬靶材,铬靶
上一页
上一页
公司地址：北京市平谷区熊儿寨乡东路16号