溅射靶材
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铬管靶材 Cr
铬管靶可加工成热等静压（HIP）整体成型铬管靶和喷涂铬管靶，两种铬管靶相比，热等静压整体成型铬管靶具有氧含量低、致密度高、镀膜均匀致密质量好等优点，缺点成本较高。
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铬管
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产品描述
铬管靶可加工成热等静压（HIP）整体成型铬管靶和喷涂铬管靶，两种铬管靶相比，热等静压整体成型铬管靶具有氧含量低、致密度高、镀膜均匀致密质量好等优点，缺点成本较高。
Compared with the spraying chromium tube target, the integral forming chromium tube target by HIP has the advantages of low oxygen content, high density, uniform and compact coating and so on.
|
性能 Product performance |
喷涂铬管靶材 Spraying chromium tube target |
热等静压整体成形铬管靶材 Integral forming chromium tube target by HIP |
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氧含量/ppm Oxygen content |
≤5000 |
80-1500 |
|
镀膜均匀性 Deposition uniformity |
1.整管轴向致密度相差较大 2.整炉上中下L、A、B值相差较大 3.无法保证产品膜层的一致性 1.The density of the tube target along the axial is different. 2.The value of L, A and B is different in the whole furnace. 3.The consistency of the product film can not be guaranteed |
1.整管均匀性高 2.密度接近于纯金属热挤压密度，管材通体密度一致 3.无松散区、无暗区 4.PVD膜层的厚度及颜色的一致性好 5.整炉上中下L、A、B值统一性好 1.High uniformity of the whole tube 2.The density of the whole tube target is close to hot extrusion density and is consistent 3.No loose area and dark area 4.The consistency of the thickness and color of the PVD film is good 4.The values of L, A and B in the whole furnace are good. 5.The value of L, A and B is consistent in the whole furnace. |
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镀膜电流密度 Deposition current density |
无法实现大电流长时间工作 Can not work for a long time at large current |
大功率长时间稳定工作 Can steadily work for a long time under high power |
关键词：
铬靶材,铬靶
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